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Fundamental Aspects of Silicon Oxidation on Hardback
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Fundamental Aspects of Silicon Oxidation

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Description

This book brings forth fundamental aspects of silicon oxidation that are key to understanding the nature of ultra-thin oxides used in microelectronics. From the wet chemical pre-cleans prior to oxidation to oxygen diffusion in oxides, the chemical, structural and kinetic elements of oxidation are presented in a tutorial fashion at both an experimental and theoretical level. Experimental results are based on powerful techniques such as photon/electron spectroscopy, ion scattering and electron/tunneling microscopy. The theories, based on first principles, focus on atomic scale processes related to silicon oxidation. In contrast to previous books dealing with the structural and electronic properties of silicon oxide, this book is solely devoted to the formation and evolution of silicon oxide, including its nitridation.
Release date Australia
April 24th, 2001
Audiences
  • Postgraduate, Research & Scholarly
  • Professional & Vocational
Contributor
  • Edited by Yves J. Chabal
Illustrations
21 Illustrations, color; 126 Illustrations, black and white; XIII, 262 p.
Pages
262
Dimensions
155x235x18
ISBN-13
9783540416821
Product ID
2108108

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