Ion Implantation and Synthesis of Materials

Name: Ion Implantation and Synthesis of Materials
SKU: 3245117
Price: 272.99 AUD
Availability: InStock

By:

Format:

Hardback

Show Hide Adult Content

$272.99

RRP:: ~~$340.95~~ save $67.96

Available from supplier

Usually ships in 3-4 weeks

0 in Trolley

Price Match

Wrap this item as a gift ($5.90) - add a free gift card on the next page

Buy Now, Pay Later with:

4 payments of $68.25 with Afterpay Learn more

Availability

Delivering to:

Estimated arrival:

Around 7-19 June using International Courier

Description

Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.

Release date Australia

August 9th, 2006

Author

Audience

Professional & Vocational

Illustrations

131 Illustrations, black and white; XIV, 263 p. 131 illus.

Pages

263

Dimensions

156x234x17

ISBN-13

9783540236740

Product ID

3245117

Customer reviews

Nobody has reviewed this product yet. You could be the first!

Write a Review

Marketplace listings

There are no Marketplace listings available for this product currently.
Already own it? Create a free listing and pay just 9% commission when it sells!

Sell Yours Here