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Doping Engineering for Front-End Processing: Volume 1070 on Hardback
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Doping Engineering for Front-End Processing: Volume 1070

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Description

Materials scientists, silicon technologists and TCAD researchers come together in this book to share experimental results and physical models, discuss achievements and challenges, and identify key issues for future research in this field. The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.
Release date Australia
October 17th, 2008
Audience
  • Professional & Vocational
Contributors
  • Edited by B. J. Pawlak
  • Edited by K. Surugo
  • Edited by M. L. Pelaz
  • Edited by M. Law
Pages
319
Dimensions
160x235x20
ISBN-13
9781605110400
Product ID
11268302

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